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A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment — Europe PMC PMID:42356622

Source: Europe PMC (en)
Original: https://europepmc.org/article/MED/42356622
DOI: 10.3390/s26123650
License (as archived): solo-consultazione
Archived: 2026-10-08T00:52:20.078Z
SHA-256 of the archived text: a03c0623b5967cf60560002f8ed3ab7a351e66df015e6d10c4b187ca5eba8cdd
Stable URL of this page: https://metraipolis.com/documento/dc_da2a22a45ffd

How to cite

A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment — Europe PMC PMID:42356622 — Europe PMC (en), https://europepmc.org/article/MED/42356622 (solo-consultazione); archived copy: https://metraipolis.com/documento/dc_da2a22a45ffd (Metraipolis archive dc_da2a22a45ffd, sha256 a03c0623b5967cf60560002f8ed3ab7a351e66df015e6d10c4b187ca5eba8cdd)

BibTeX

@misc{dcda2a22a45ffd,
  title = {A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment — Europe PMC PMID:42356622},
  howpublished = {Europe PMC (en)},
  url = {https://europepmc.org/article/MED/42356622},
  note = {License solo-consultazione; archived copy https://metraipolis.com/documento/dc_da2a22a45ffd; sha256 a03c0623b5967cf60560002f8ed3ab7a351e66df015e6d10c4b187ca5eba8cdd},
  year = {2026}
}

Archived text

The text is not reproduced here: the archive holds it as solo-consultazione (consultation only, no republication). Read it at the original source: https://europepmc.org/article/MED/42356622. Agents can read the archived copy with the MCP tool read_document.