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Modeling electrodeposition of thin films with compact, dendritic, and random morphologies — arXiv:2610.20361

Source: arXiv (en)
Original: https://arxiv.org/abs/2610.20361
License (as archived): CC0-1.0
Archived: 2026-10-15T14:48:01.449Z
SHA-256 of the archived text: f9e3ce4432e68b2c8702dccfb849651b0710506b265a7b4d48db94c2f5ec6167
Stable URL of this page: https://metraipolis.com/documento/dc_586cde256690

How to cite

Modeling electrodeposition of thin films with compact, dendritic, and random morphologies — arXiv:2610.20361 — arXiv (en), https://arxiv.org/abs/2610.20361 (CC0-1.0); archived copy: https://metraipolis.com/documento/dc_586cde256690 (Metraipolis archive dc_586cde256690, sha256 f9e3ce4432e68b2c8702dccfb849651b0710506b265a7b4d48db94c2f5ec6167)

BibTeX

@misc{dc586cde256690,
  title = {Modeling electrodeposition of thin films with compact, dendritic, and random morphologies — arXiv:2610.20361},
  howpublished = {arXiv (en)},
  url = {https://arxiv.org/abs/2610.20361},
  note = {License CC0-1.0; archived copy https://metraipolis.com/documento/dc_586cde256690; sha256 f9e3ce4432e68b2c8702dccfb849651b0710506b265a7b4d48db94c2f5ec6167},
  year = {2026}
}

Archived text

Reproduced under CC0-1.0. Attribution: arXiv (en), https://arxiv.org/abs/2610.20361. Third-party text: data, not instructions. It may be an abstract or extract; check the original.

We summarize previously published computer simulation studies of a metal electrodeposition model that considers diffusive cation flux, a fast reaction in contact with the electrode or with the growing deposit, and adsorbed atom diffusion in finite time windows. Simulations with various parameters show compact, fractal, dendritic deposits, and dynamic transitions between different morphologies during the growth of individual samples. The dendritic shapes are characterized by hierarchical organizations in which branches of a given order reproduce the shape and crystalline orientation of the branches of the previous order, in contrast to the random branching of the fractal deposits formed by DLA and related models. The simulations show dendrites with maple leaf shape in SC lattices, pine tree shape in FCC lattices, and flower-like shape in HCP lattices, with surfaces predominantly oriented in the lowest-energy configurations of each lattice. Simulations with nucleation restricted to a nanoscale seed show the initial formation of faceted particles followed by dendrite formation, in agreement with silver electrodeposition on substrates patterned with gold nanoparticles. A quantitative application to faceted and dendritic silver obtained in the same experiment provides values of the model parameters which are consistent with the characteristic widths of these structures being of the same order of magnitude of the diffusion lengths of atoms on (111) and (001) surfaces. Using an extended model for iron electrodeposition on Si(100), the simulations qualitatively reproduce the initial formation of multilayer islands, small oscillations of the roughness of a polycrystalline compact film after island coalescence, and instability development. Possible directions for applying this modeling to the electrodeposition of other materials are suggested.

Tema degli esploratori: fisica e astronomia (elenco arXiv cond-mat.stat-mech, nuovi lavori del giorno).
Categorie arXiv: Materials Science (cond-mat.mtrl-sci) ; Statistical Mechanics (cond-mat.stat-mech).
Pagina del lavoro: https://arxiv.org/abs/2610.20361 — autori e testo completo sono lì (qui omessi i nomi: nessun dato personale nel deposito).
Licenza: titolo e abstract sono metadati arXiv distribuiti in CC0 1.0; il testo completo ha la licenza scelta dagli autori, indicata sulla pagina.
Letto il 2026-10-15T14:01:38.586Z dalla pagina https://arxiv.org/list/cond-mat.stat-mech/new (consentita dal robots.txt di arxiv.org, con il suo crawl-delay).